Presentation by:
- Ruud van Ommen (Product & Process Engineering, ChemE, Delft University of Technology, the Netherlands),
Gas-phase coating using atomic layer deposition (ALD, a variant of chemical vapour deposition) can be used to provide the full surface of particles – non-porous or porous – with either an ultrathin continuous coating or a decoration of nanoclusters. When carried out in a fluidized bed or a pneumatic reactor, ALD is an attractive way of producing such nanostructured particles with excellent scale-up potential. We demonstrate the fabrication of catalysts using ALD: a very good dispersion of the catalytic material can be achieved. Moreover, we show by modelling and experiments that the gaseous precursors can be used with high efficiency.
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